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dielectric breakdown properties in 50%SF6-50%CF4mixtures

The characteristics of Si etching with electron cyclotron resonance (ECR) plasma of SF6–CF4 are studied in order to improve anisotropy in dry etching

【PDF】COLD-WEATHER APPLICATION OF GAS MIXTURE (SF6/N2, SF6/CF4)

These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to

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g3 gas with 4% NOVECTM 4710/96% CO2 was gas or gas mixture for substituting SF6. Trifluoroiodomethane (CF3I) has been introduced

Solubility of Gases in Liquids. 20. Solubility of He, Ne, Ar,

CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, and appropriate molecular and/or bulk properties of the gases and n-

Sulfur hexafluoride, Refrigerat Gas, Tetrafluoromethane CF4

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The film's deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

CF_4-

Anisotropic etching of Si and WSiN using ECR plasma of SF6-CF4 gas mixture on ResearchGate, the professional network for scientists. Anisotropic etchin

【PDF】Cold Weather Applications of Gas Mixture (SF6/N2, SF6/CF4)

SF6 /N2 -- 5 -- 2 19 SF6/CF4 2 62 7 46 16 MIXED GAS CIRCUIT BREAKERS • S•FF6i/rNst2 mixture: breakers purchased (1988 – 1990) were

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Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2

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C_4F_8、CF_4-

The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

Sulfur hexafluoride (SF6) is used as a gas medium in gas-insulated whereas CF4- and SF6-treated CNTs are highly ive to NH3 to

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- Reactive ion etching of SiC in SF6 gas: detection of CF,

Reactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2 etch products. Applied Physics Letters, American Institute of Physics, 2001,

Properties of Binary Gas Mixtures of CH4, CF4, SF6, and C(

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

SF6, CO, CH4, C2H4, C2H6, CF4, CO2, C4F8, O2, Ar, Ne, He, Kr,

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Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SF<sub>6</sub> gas has excellent dielectric strength, but it causes global warming about 23900 times more than CO<sub>2</

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field breakdown characteristics of SF6/CF4 mixtures at

The breakdown and the corona inception voltages experiments of SF<sub>6</sub>/CF<sub>4</sub> mixtures in non-uniform

in the dielectric strength of SF6+CF4+Ar mixtures (a) 40%

Download scientific diagram| The synergism in the dielectric strength of SF6+CF4+Ar mixtures (a) 40% Ar black line, (b) 50% Ar red line, (c)

Electron swarm coefficients in SF6 and CF4 gas mixtures from

The European Physical Journal Applied Physics (EPJ AP) an international journal devoted to the promotion of the recent progresses in all fields

150%SF_6-50%CF_4-

The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

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Negative ion motion in the mixtures of SF6 with CF4 and CH4-Ar.

This paper deals with the measurement of the mobility of negative ions in the mixtures of SF6 with CF4 and the CH4-Ar (50:50) binary mixture with

for separation of SF6 from CF4 /air-containing gas stream

2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su