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SF6 and CF4 gases, leading to high corresponding to the N2 molecule are observed (-generated plasmas produced in Ar/SF6 mixtures

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2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

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C2CL2F3CF4CF2CL2C2F6SF6-N2CCL2F2CF3CF2CLC4F8

Solubility of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in 2,2,4-Trimethylpentane at

electron swarm coefficients of the CF3ISF6 gas mixture |

150%SF_6-50%CF_4-

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Decomposed Das Density of CF3I as a Substitute for SF6 Gas

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Reactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2 etch products. Applied Physics Letters, American Institute of Physics, 2001,

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Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

dielectric breakdown properties in 50%SF6-50%CF4mixtures

Solubility of Gases in Binary Liquid Mixtures: An Experimental and 20. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in

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Gas Sensing Characteristics of Multiwalled Carbon Nanotubes by CF4 Plasma (SF6) is used as a gas medium in gas- insulated switchgear (GIS),

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The breakdown and the corona inception voltages experiments of SF<sub>6</sub>/CF<sub>4</sub> mixtures in non-uniform

spark decomposition of SF6 and 50% SF6 + 50% CF4 mixtures

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Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6 at Two Film gas mixture density heat capacity forced convective heat transfer heat transfer

【PDF】COLD-WEATHER APPLICATION OF GAS MIXTURE (SF6/N2, SF6/CF4)

These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to

of Gases in Liquids. 20. Solubility of He, Ne, Ar, Kr, N2,

The Ostwald coefficients L2,1 of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, 6 ≤ l

Electron swarm coefficients in SF6 and CF4 gas mixtures from

Electron swarm coefficients in SF6 and CF4 gas mixtures from Monte Analysis of the insulation characteristics of c-C4F8 and N2 gas

Properties of Binary Gas Mixtures of CH4, CF4, SF6, and C(

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

the dynamic characteristics and decaying behavior of SF6

The film's deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

(SF6) is used as a gas medium in gas-insulated switchgear (GIS), whichO2, N2, CF4, and Ar, plasma, and so forth are used to etch the

9 Unit 1660 MFC UFC 1660 CF4 H2 CL2 N2 HBR SF6 Different Gas

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CFCN/N

The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~,

2015311-Get this from a library! Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~, CH4~, C2~H4~, C2~H6~, CF4~ and SF6~

of Si and WSiN using ECR plasma of SF6-CF4 gas mixture

Anisotropic etching of Si and WSiN using ECR plasma of SF6-CF4 gas mixture on ResearchGate, the professional network for scientists. Anisotropic etchin

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